| Thin-film deposition |
Sputtering, e-beam and thermal evaporation, ALD, PECVD |
Metal contacts, dielectric layers, optical coatings, seed layers |
| Lithography |
Photolithography, direct-write, e-beam lithography |
Electrodes, microfluidic channels, sub-micron features |
| Etching |
Dry etching (RIE, ICP) and wet etching |
Pattern transfer, trenches, membrane and structure release |
| Thermal and surface |
Rapid thermal and furnace annealing, plasma cleaning |
Contact annealing, film crystallization, surface preparation |
| Imaging and metrology |
SEM, AFM, profilometry, ellipsometry, electrical test |
Film thickness, feature dimensions, device characterization |
| Dicing and packaging
Via partner facility, quoted per project
|
Wafer dicing, wire bonding, chip mounting |
Singulated dies, test-ready packaged devices |